Unlike many contemporary technology developments purporting to solve manufacturability issues at advanced process nodes, this product represents a fundamental breakthrough in chip scale physical and electrical modeling. Integrated with incremental sign-off quality analysis and advanced optimization capability, this technology allows us to accurately handle today's most demanding sub-wavelength lithography and manufacturing process rules, and sets the stage to efficiently evolve our capabilities in accordance with the currently published International Semiconductor Association roadmap.
Ted Vucurevich
It was a big play and it didn't work. The problem with the model had to do with what the industry was ready to accept. The industry wanted either commodity work or very specialized work.
work model problem play industry big accept ready
rules quality technology analysis process issues stage contemporary evolve physical modeling
The foundations of what we had before may not be what we'll have going forward.
forward
You must log in to post a comment.
There are no comments yet.